Your Role

You will be part of an interdisciplinary team of experts for the development of repair processes of lithographic masks for semiconductor industry. The corresponding repair processes of our MeRiT product family are based on gas assisted electron beam induced processing (FEBIP). In FEBIP suitable gases are dosed onto and adsorbed on the mask surface will be locally dissociated by the impact of a focused electron beam eventually leading to deposition or etching, i.e., additive respective subtractive processing of the mask. Your task will be to develop/adapt a simulation software for FEBIP to support and improve our repair processes. You will perform corresponding FEBIP/repair experiments to evaluate the accuracy of the simulation and to determine urgently needed parameters for the simulation package. The goal is to develop the FEBIP simulation into a powerful tool to learn about and advance our repair processes.

Your activity includes:

• Responsible for the development of a capable FEBIP simulation

• Plan, organize and carry out development work independently

• Systematic documentation and archiving of research and development work

• Document, prepare, report and present work progress

• Support with customer inquiries

Your Profile

• A degree in natural sciences or engineering e.g. physics, chemistry, materials science, ideally with a doctorate

• Experience in simulating complex surface reactions, ideally the simulation of FEBIP processes

• Ideally a background in “Surface Science” with chemical processes on surfaces, and/or gas-assisted electron beam lithography

• Ideally experience with high-resolution microscopic and spectroscopic or spectromicroscopic methods

• Good knowledge of spoken and written English

Your ZEISS Recruiting Team: